| 贵金属靶材相关中国专利分析 |
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| 引用本文： | 江丹平,雷继锋,吕景波,郝海英,胡通,户赫龙.贵金属靶材相关中国专利分析[J].贵金属,2022,43(S1):75-78. |
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| 作者姓名： | 江丹平 雷继锋 吕景波 郝海英 胡通 户赫龙 |
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| 作者单位： | 有研亿金新材料有限公司 北京翠铂林有色金属技术开发中心有限公司，北京 102200 |
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| 基金项目： | 北京市科技计划项目(Z201100004320015) |
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| 摘 要： | 贵金属靶材在半导体集成电路、显示器、电子部件反射膜、光学记录媒体、磁记录材料、玻璃功能薄膜、装饰首饰等领域有广泛的应用，本文通过检索贵金属靶材相关中国专利，总结了贵金属靶材专利的种类分布、热点技术、应用领域等，揭示了贵金属靶材领域的研究和知识产权保护方向。
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| 关 键 词： | 贵金属 靶材 磁控溅射 薄膜材料 |
| 收稿时间： | 2021/8/30 0:00:00 |
Analysis of Chinese patents related to precious metal targets |
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| Affiliation: | GRIKIN Advanced Material Co. Ltd., Beijing Trillion Metals Co. Ltd., Beijing 102200, China |
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| Abstract: | Precious metal targets are widely used in semiconductor integrated circuits, displays, reflective films of electronic components, optical recording media, magnetic recording materials, glass functional films, decorative jewelry and other fields. By searching the relevant Chinese patents of precious metal targets, this paper summarizes the types, distribution, hot technologies and application fields of precious metal target patents. The research and intellectual property protection direction in the field of precious metal targets are revealed. |
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| Keywords: | precious metals targets magnetron sputtering thin film |
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