原子层沉积薄膜之激光损伤性能分析

采用目前尚在国内鲜有报道的原子层沉积技术在熔石英和BK7玻璃基片上镀制了TiO2单层膜、AlO3单层膜以及TiO2/Al2O3增透膜,沉积温度在110℃和280℃.利用X射线粉末衍射仪对膜层微观结构进行了分析研究,并在激光损伤平台上进行了抗激光损伤阈值的测量.采用Nomarski微分干涉差显微镜和原子力显微镜对激光损伤...

Laser damage properties of thin films grown by atomic layer deposition

Atomic layer deposition（ALD） has been reported rarely in China.ltl this paper,it has been used to deposit TiO2 single layer,Al2O3 single layer and TiO2/Al2O3 anti-reflective films at 110℃ and 280℃ on quartz and BK7 substrates.Microstructure of the thin films was investigated by X-ray diffraction.Laser induced damage threshold（LIDT） of samples was measured by a damage test system.Damaged morphology of the samples was investigated by atomic force microscope（AFM） and Nomarski optical microscope.The results show that the films deposited by ALD had better uniformity and transmission,in this paper,the uniformity is better than 99% over 50 mm samples and the transmission is more than 99.8% at 1064 nm.Deposition temperaturc affects the deposition rate,the thin film microstructure and further influences the LIDT of the thin films.As to thc TiO2/Al2O3 films,the LIDTs were 6.73±0.47 J/cm2 and 6.5±0.46 J/cm2 at 110 ℃ on quartz and BK7 substrates,respectively.The LIDTs at 110℃ are notably better than 280℃.