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红外发射率控制方法及机理研究
引用本文:路远,李玉波,乔亚,吴丹.红外发射率控制方法及机理研究[J].红外技术,2008,30(5):294-296.
作者姓名:路远  李玉波  乔亚  吴丹
作者单位:电子工程学院安徽省红外与低温等离子体重点实验室,安徽,合肥,230037
摘    要:红外发射率的控制具有广泛的用途,根据电磁波理论,讨论了物体表面的发射率与折射率的关系,折射率大的物体发射率低.电致变色材料是一种可控制其表面折射率和发射率的材料.以氧化钨为例探讨了发射率的控制方法.利用电场对三氧化钨薄膜进行离子和电子的共注入和共抽取,三氧化钨中的载流子浓度发生了变化,折射率和红外发射率也发生了变化.

关 键 词:红外发射率  折射率  控制  三氧化钨
文章编号:1001-8891(2008)05-0294-03
修稿时间:2008年4月17日

The Study on the Method and Mechanism to Control the Infrared Emissivity
LU Yuan,LI Yu-bo,QIAO Ya,WU Dan.The Study on the Method and Mechanism to Control the Infrared Emissivity[J].Infrared Technology,2008,30(5):294-296.
Authors:LU Yuan  LI Yu-bo  QIAO Ya  WU Dan
Affiliation:LU Yuan,LI Yubo,QIAO Ya,WU Dan(Key Lab of Infrared , Low Temperature Plasma of Anhui Province,Electronic Engineering Institute,Hefei Anhui 230037,China)
Abstract:It has wide usage to control the infrared emissivity of object.Based on the theory of electromagnetic wave,the relationship between emissivity and refractive index was discussed.An object which has higher refractive index processes lower emissivity.is the kind material which's emissitvity and refractive index of electrochromic material can be controlled.WO3 has been used as an example to explain how to control the emissivity.When the ions and the electrons have been injected into or taken out of the WO3 fil...
Keywords:infrared emissivity  refractive index  control  WO3  
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