Size effect in the low-field Hall coefficient of single-crystal copper films |
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| Authors: | I. Sakamoto M. Fukuhara Y. Koide K. Yonemitsu |
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| Affiliation: | (1) Department of Physics, Faculty of Science, Tokyo Metropolitan University, Tokyo, Japan;(2) Present address: Nippon Schlumberger, Tokyo, Japan;(3) Present address: Hitachi Microcomputer Engineering, Tokyo, Japan |
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| Abstract: | Measurements of the low-field Hall coefficientRH of single-crystal copper films were made at 4.2 K by the use of a SQUID. The surface normaln of the samples was directed in the [100], [110], and [111] directions and the ratio of the thickness to the mean free path ranged from 0.1 to 0.7. It is found that the effect of surface scattering causesRH to decrease whenn  [100], whereas it causesRH to increase whenn [110] and [111]. This behavior is interpreted in terms of the geometrical characteristics of the Fermi surface. |
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