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Ru-doped nanostructured carbon films
Authors:G D Lian  E C Dickey  M Ueno  M K Sunkara
Affiliation:

a Department of Materials Science and Engineering and Materials Research Institute, University Park, PA 16802, USA

b Department of Chemical Engineering, University of Louisville, Louisville, KY 40292, USA

Abstract:Pure and Ru-doped carbon films are deposited on Si (100) substrates by electron cyclotron resonance chemical vapor deposition. The films are characterized by transmission electron microscopy, electron energy loss spectroscopy, energy dispersive X-ray spectroscopy and atomic force microscopy. In both the pure and Ru-doped samples, diamond nanocrystallites are formed in amorphous carbon matrices. The Ru-doped film contains much smaller diamond nanocrystallites (approx. 3 nm) than the pure samples (approx. 11 nm). Lower surface roughnesses are observed in both pure and Ru-doped samples as compared to other reported nanocrystalline diamond films. The conductivity of the Ru-doped film is significantly higher than that of the pure film. The results show that Ru-doped nanocrystalline diamond films have unique structures and properties as compared to pure nanocrystalline diamond films or metal doped diamond-like carbon films, which may offer advantages for electrochemical, optical-window, field emission or tribological applications.
Keywords:Cyclotron resonance chemical vapor deposition (CVD)  Nanocrystalline diamond (NCD) films  Ru-doped  Electron microscopy  Electron energy loss spectroscopy
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