短脉冲XeCl激光动力学模型及辉光抽运设计

以薄膜沉积、外延生长及后续的光刻、激光与物质的相互作用、等离子体研究为目的,研究了XeCl动力学模型及辉光实现。采用辉光脉冲放电方法,实现了激光输出,根据动力学方程、XeCl激光四能级模型,计算了XeCl反应速率及密度。结果表明,辉光放电稳定,激光脉宽短,功率高,辉光放电体积大,激光脉宽18ns,单脉冲能量450mJ,矩形光斑2cm×1cm,束散角3mrad。动力学分析和系统模型成立,激光对靶材溅射获得了等离子羽辉。

Dynamic model of a new XeCl laser with short duration time and UV grow discharge system design

A new high power,short duration time XeCl laser is realized in order to prepare microstructure of quantum effect,depositing film,molecular beam epitaxy and analysis of output pulse profiles. It adopts the method of glow discharged,the calculation of dynamic equation,the analysis velocity reaction and density of XeCl laser,and UV preionization. In the addition,the parameters of the laser are also measured. The results are wavelength 308nm,the pulse duration time 18ns,the pulse energy 450mJ and the beam divergence angle 3mrad. It is shown that the proposed glow discharged is realized,the dynamic equation model of laser is correct,and the laser has high efficiency to produce the vapor plasma plume.It can be applied in the interaction between laser and material,material plasma study.