Micropatterning on Methylsilsesquioxane– Phenylsilsesquioxane Thick Films by the Sol–Gel Method |
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| Authors: | Atsunori Matsuda Teruyuki Sasaki Masahiro Tatsumisago Tsutomu Minami |
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| Affiliation: | Department of Applied Materials Science, Graduate School of Engineering, Osaka Prefecture University, Sakai, Osaka 599–8531, Japan |
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| Abstract: | Prismatic patterns with a pitch of 30 μm and a slant height of 30 μm were embossed successfully in 70:30 (in mol%) methylsilsesequioxane:phenylsilsesqeioxane (MeSiO3/2–PhSiO3/2) thick films on glass substrates by laminating an organic polymer sheet as a stamper with the patterns against the films. The embossed shape of the prismatic patterns precisely agreed with the negative shape of those of the stamper that was used. The resultant MeSiO3/2–PhSiO3/2 films were transparent, and the refractive index of the films was adjusted to 1.51, to match that of the glass substrate. |
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| Keywords: | thick films sol-gel substrates |
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