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半导体表面电学特性微观四点探针测试技术研究进展
引用本文:李建昌,王永,简晓慧,巴德纯. 半导体表面电学特性微观四点探针测试技术研究进展[J]. 真空, 2011, 48(1)
作者姓名:李建昌  王永  简晓慧  巴德纯
作者单位:东北大学,机械工程与自动化学院,真空流体工程研究中心,辽宁,沈阳,110004
基金项目:中央高校基本科研业务费专项资金资助
摘    要:四探针法是材料学及半导体行业电学表征的常用方法.随着微电子器件尺度持续减小,新型纳米材料研究不断深入,须将探针间距控制到亚微米及其以下范畴才能获得更高的空间分辨率和表面灵敏度.近年来研究人员借助显微技术开发出两类微观四点探针测试系统,即整体式微观四点探针和独立四点扫描隧道显微镜探针系统,随着现代微加工技术的发展,当前探针间距已缩小到几十纳米范围.本文综述了微观四点探针技术近年来的研究进展,主要包括测试理论、系统结构与探针制备.其中,特别详述了涉及探针制备的方法、技术及所面临问题,并展望了微观四点探针研究的发展方向,并给出了一些具体建议.

关 键 词:四探针  微观四点探针  探针制备  表面电导率

Latest development of electrical characterization of semicondutor surface by microscopic four-point probe technique
LI Jian-chang,WANG Yong,JIAN Xiao-hui,BA De-chun. Latest development of electrical characterization of semicondutor surface by microscopic four-point probe technique[J]. Vacuum(China), 2011, 48(1)
Authors:LI Jian-chang  WANG Yong  JIAN Xiao-hui  BA De-chun
Affiliation:LI Jian-chang,WANG Yong,JIAN Xiao-hui,BA De-chun(Vacuum and Fluid Engineering Research Center,School of Mechanical Engineering and Automation,Northeastern University,Shenyang 110004,China)
Abstract:Four-point probe characterization is a usual method for studying the electrical properties of solids and thin films.The distance between tip and sample in four-point probe technique has to be reduced to sub-micro scale at least in order to obtain expected surface sensitivity and spatial resolution.Therefore,microscopic four-point probes(M4PPs) need to be combined with some microscopy techniques.Two types of M4PPs have been developed in the past few years,which are monolithic micro-four-point probes and four...
Keywords:four-point probes  microscopic four-point probes  probe preparation  surface conductivity  
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