Thin film metallization by magnetron sputtering from highly pure molybdenum targets

Both vacuum and powder metallurgy methods of preparation of molybdenum for magnetron-sputtering targets were studied. It is found that a combination of multiple-electron-beam melting and electric arc vacuum melting is an optimal metallurgical method to obtain highly pure molybdenum polycrystalline ingots for massive magnetron targets. Highly sensitive methods of analysis were used to characterize the molybdenum target. The specific resistivity of deposited thin molybdenum films was found to be strongly dependent on both the sputtering conditions and the initial target purity.