| 薄层电阻标样及Mapping在IC制造中的应用研究 |
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| 引用本文： | 周全德. 薄层电阻标样及Mapping在IC制造中的应用研究[J]. 微纳电子技术, 2000, 0(4) |
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| 作者姓名： | 周全德 |
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| 作者单位： | 上海市计量测试技术研究院!上海200233 |
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| 摘 要： | 提出对集成电路在线监控中使用相关薄层电阻标样的必要性和重要性。着重介绍了薄层电阻标样和 Mapping技术在验证仪器各档测量薄层电阻误差 ,对外延生长工艺监控 ,判断离子注入退火后薄层电阻均匀性差的原因 ,监视扩散炉内部温度与气流对扩散影响和监控溅射铝层厚度质量等应用。
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| 关 键 词： | 薄层电阻 标样 |
Application of a Set of Standard Wafers for Mapping Sheet Resistance in Manufacturing of IC |
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| Zhou Quande. Application of a Set of Standard Wafers for Mapping Sheet Resistance in Manufacturing of IC[J]. Micronanoelectronic Technology, 2000, 0(4) |
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| Authors: | Zhou Quande |
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| Abstract: | It is necessary to monitor manufacturing processes of IC using a set of standard wafers.This paper emphasizes the following points:the measurement errors using the standard wafers in each range,process monitoring of epitaxial growth,to determine the causes of poor resistance uniformity after ion implantation anneal,measuring the effects for diffusion by temperature and airflow in diffusion furnace,and to monitor the quality of sputter aluminum film. |
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| Keywords: | Sheet resistance Standard wafer |
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