| ZrO2薄膜的XPS分析 |
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| 引用本文： | 夏风,刘光葵.ZrO2薄膜的XPS分析[J].功能材料,1997,28(4):408-410. |
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| 作者姓名： | 夏风 刘光葵 |
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| 作者单位： | 华中理工大学材料系 |
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| 摘 要： | 用射频溅射制备了氧化锆薄膜，用Ｘ光电子能谱技术分析了ＹＳＺ膜的结构，发现低能轰击会引起膜中钇的反优再溅射，造成钇的分布不均匀导致单斜相的出现。
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| 关 键 词： | 溅射 XPS YSZ 薄膜 二氧化锆 陶瓷 |
XPS Analysis of ZrO 2 Thin Film |
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| Xia Feng,Liu Guangkui,Qian Xiaoliang,Sun Yaoqing.XPS Analysis of ZrO 2 Thin Film[J].Journal of Functional Materials,1997,28(4):408-410. |
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| Authors: | Xia Feng Liu Guangkui Qian Xiaoliang Sun Yaoqing |
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| Abstract: | ZrO 2 (YSZ) thin film was deposited by rf sputtering and it was analysed by XPS. It is believed that the low energy bombardment of Ar ion on the film will arouse the preferable sputtering and the non uniform distribution of yttrium,cause the existence of monocline phase in the film. |
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| Keywords: | sputtering XPS ZrO 2 thin film |
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