| 掩模版升降定位存取机构 |
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| 引用本文： | 马喜宝,董同社. 掩模版升降定位存取机构[J]. 电子工业专用设备, 2011, 40(6): 10-12,15 |
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| 作者姓名： | 马喜宝 董同社 |
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| 作者单位： | 上海微高精密机械工程有限公司,上海,201203 |
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| 摘 要： | 针对90 nm及以下线宽光刻设备对掩模版升降定位存取机构功能和性能的需求,确定了掩模版升降定位存取机构的基本构架,并对机构进行了设计.
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| 关 键 词： | 掩模版 升降机构 定位存取机构 锁定 解锁 |
Design of Reticle Elevator and Holder |
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| MA Xibao,DONG Tongshe. Design of Reticle Elevator and Holder[J]. Equipment for Electronic Products Marufacturing, 2011, 40(6): 10-12,15 |
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| Authors: | MA Xibao DONG Tongshe |
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| Affiliation: | MA Xibao,DONG Tongshe (Shang hai nanpre mechanics Co.,Ltd.,Shanghai 201203,China) |
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| Abstract: | For meeting the funtion and performance requirements to reticle elevator and holder of 90nm and sub-90nm node lithographic projection apparatus,framework and detailed design of reticle elevator and holder is studyed. |
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| Keywords: | Reticle(Mask) Reticle elevator Reticle holder Lock Unlock |
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