| 碱性腐蚀工艺条件对硅片表面腐蚀形貌的影响 |
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| 引用本文： | 孙俭. 碱性腐蚀工艺条件对硅片表面腐蚀形貌的影响[J]. 电子工业专用设备, 2011, 40(3): 28-30 |
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| 作者姓名： | 孙俭 |
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| 作者单位： | 中国电子科技集团公司第四十六研究所; |
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| 摘 要： | 碱性腐蚀工艺条件对硅片表面腐蚀形貌如粗糙度、显微镜下的表面状况的影响做了研究,通过实验结果给出了特定要求条件下硅片腐蚀的最佳方案.运用硅的化学腐蚀机理分析了表面腐蚀状况的原因.
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| 关 键 词： | 腐蚀 表面形貌 硅片 |
Affection of Base Etch Condition on Silicon Surface Quality |
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| SUN Jian. Affection of Base Etch Condition on Silicon Surface Quality[J]. Equipment for Electronic Products Marufacturing, 2011, 40(3): 28-30 |
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| Authors: | SUN Jian |
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| Affiliation: | SUN Jian (The 46th Research Institute of CETC,Tianjin 300220) |
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| Abstract: | The article was addressed on the research of the affection of the etch condition on the silicon surface quality,such as the surface roughness and the surface state using the microscope inspection.The fit process condition was got by many experiments.Through the analysis of the silicon chemical etch mechanism,the surface quality of the silicon etched wafers was controlled. |
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| Keywords: | Chemical etch Surface quality Silicon |
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