Thermowetting embossing nanoimprinting of the organic-inorganic hybrid materials |
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Authors: | Woo-Soo Kim Young-Cheol Kim |
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Affiliation: | a Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Guseong-dong Yuseong-gu 373-1, Daejon, Republic of Korea b Department of Material Science and Engineering, Korea University of Technology and Education, Gajun Byeongcheon 307, Cheonan, Republic of Korea |
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Abstract: | A new UV-based soft-lithographic technique for submicron patterns via thermowetting of organic-inorganic hybrid materials is described. Specifically, 300-nm scale patterns were replicated utilising this coating-free fabrication method. With thermowetting embossing nanoimprinting technique, a poly(dimethyl siloxane) (PDMS) mold with a submicron-scale relief was placed on a thermally wetted organic-inorganic hybrid material, which was then polymerized with UV light. The thermowetting embossing nanoimprinting technique can be applied universally to patternable organic-inorganic hybrid materials, such as methacrylic and vinylic organic-inorganic hybrid materials. Fabricated submicron patterns can also be applied to the nanoscale patterning, e.g., arrayed photonic band gap materials. |
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Keywords: | Silicon oxide Wetting Nano sturctures |
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