CLS AND AES STUDIES OF OXYGEN ADSORPTION AND INITIAL OXIDATION ON CLEAN In SURFACE

The adsorption of oxygen and initial stages of oxidation on clean In surface were studied using CLS and AES. It was observed that the oxygen was already absorbed on the surface at low oxygen exposure down to 10~(-2)LO_2. A monolayer oxide on In can be found at exposure of 10~2LO_2 and a continuous metal free thicker oxide layer at 10~3LO_2, then a fast adsorption stage is followed by a slower one after 10~3LO_2