加Si提高PCVD TiN基镀层的耐蚀性和力学性能

在直流PCVDTiN镀膜过程中，加入Si形成（Ti，Si）N镀层。用SiH4作为气源，代替一部分金属卤化物，可降低镀层中的氯含量。含16％Si的（Ti，St）N比二元TiN镀层有较高的硬度。用划痕法和对滚法评定了二者的结合强度。三元镀层在界面上用TiN作底层，则TiN和（Ti，Si）N的界面疲劳强度是相同的。（Ti，Si）N比TiN在高温下有较高的抗氧化性能。用电化学腐蚀方法测定在3．5％NaCl溶液中的耐腐蚀性表明，（Ti，Si）N镀层优于TiN。

Improving Anti-Corrosion and Mechanical Behavior of PVCD TiN

in the DC power supply PCVD TiN coating process, Si is introduced to form (Ti,Si)N coating layer. A Part of metal chloride in the precursor is replaced by SiH, gas,the chlorine content in the coating layer is reduced. The (Ti,Si)N with 16wt%Si exhibits higher hardness than that of binary TiN coating. The bonding strength are evaluated with scratch test and contact rolling test. When the composition of the ternary layer is tailored to set the TiN in the interface region the interfacial fatigue strengths of TiN and (Ti,Si)N show the same magnitude. The oxidization resistance at elevated temperature for (Ti,Si)N is higher than that of TiN.The Aqueous corrosion behavior of the (Ti,Si)N coated material is also better than the TiN coated material as shown by electrochemical measurement.