| Abstract: | The design of a small complex-type focussed magnetron with a long target-lifeused for excited multi-atoms beam film deposition in hard coatings is described. Themagnetron tunnel of the magnetron source was constructed by a planar unbalancedmagnetic annulus, which comes from the extended co-axial magnetron principle andinside cylindrical magnet tunnel. The use efficiency of inside circular cone sputteringtarget area is high up to 62%. The illside-inversion cone sputtering target has a longlife and results in a higher deposition rate 35 "m/min for Ti at a 2.5 Pa Ar pressure.A better focussing direction of ejecting atom beam has been achieved, and the arcpower input is 300W for Ti target. |
