Optimization of sawtooth surface-relief gratings: effects of substrate refractive index and polarization |
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Authors: | Wu Shun-Der Gaylord Thomas K Glytsis Elias N |
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Affiliation: | School of Electrical and Computer Engineering, Microelectronics Research Center, Georgia Institute of Technology, Atlanta 30332, USA. |
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Abstract: | The effect of the refractive index of the substrate together with the incident polarization on the optimization of sawtooth surface-relief gratings (SRGs) is investigated. The global optimum diffraction efficiencies of the -1st forward-diffracted order of sawtooth SRGs are 63.3% occurring at n2=1.47 for TE polarization and 73.8% occurring at n2=2.88 for TM polarization. Incident TE polarization has higher optimum diffraction efficiency than TM polarization for all n2<1.85. In contrast, TM polarization has higher optimum diffraction efficiency than TE polarization for all n2>1.85. A polymer (n2=1.5) optimum sawtooth SRG exhibits 62.6% efficiency for TE polarization. A silicon (n2=3.475) optimum sawtooth SRG exhibits 68.6% efficiency for TM polarization. These sawtooth SRGs are compared to right-angle-face trapezoidal SRGs. It is found that the optimum profiles of right-angle-face trapezoidal SRGs have only very slightly increased efficiencies over sawtooth SRGs (0.04% for TE and 0.55% for TM). |
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