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Broadening the applications of the atom probe technique by ultraviolet femtosecond laser
Authors:Hono K  Ohkubo T  Chen Y M  Kodzuka M  Oh-ishi K  Sepehri-Amin H  Li F  Kinno T  Tomiya S  Kanitani Y
Affiliation:a National Institute for Materials Science, Tsukuba 305-0047, Japan
b Graduate School of Pure and Applied Sciences, University of Tsukuba, Tsukuba 305-0047, Japan
c Corporate R&D Center, Toshiba Corporation, Saiwai-ku, Kawasaki 212-8582, Japan
d Advanced Materials Laboratory, Sony Corporation, Atsugi, Kanagawa 243-0021, Japan
e CREST, Japan Science and Technology Agency, Japan
Abstract:Laser assisted field evaporation using ultraviolet (UV) wavelength gives rise to better mass resolution and signal-to-noise ratio in atom probe mass spectra of metals, semiconductors and insulators compared to infrared and green lasers. Combined with the site specific specimen preparation techniques using the lift-out and annular Ga ion milling in a focused ion beam machine, a wide variety of materials including insulating oxides can be quantitatively analyzed by the three-dimensional atom probe using UV laser assisted field evaporation. After discussing laser irradiation conditions for optimized atom probe analyses, recent atom probe tomography results on oxides, semiconductor devices and grain boundaries of sintered magnets are presented.
Keywords:Atom probe  Laser atom probe  Field evaporation  Atom probe tomography
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