Electrical and photoelectric properties of anisotype n-TiN/p-Si heterojunctions |
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Authors: | M. M. Solovan V. V. Brus P. D. Maryanchuk |
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Affiliation: | 1. Chernivtsy National University, Chernivtsy, 58012, Ukraine 2. Institute of Materials Science Problems, National Academy of Sciences of Ukraine, Chernivtsy Branch, Chernivtsy, 58001, Ukraine
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Abstract: | Photosensitive n-TiN/p-Si heterojunctions are fabricated by the reactive magnetron sputtering of a thin titanium-nitride film with n-type conductivity onto polished polycrystalline p-Si wafers. The I–V characteristics of the heterostructures are measured at different temperatures. The temperature dependences of the potential-barrier height and series resistance of the n-TiN/p-Si heterojunction are studied. The dominant mechanisms of current transport through the heterojunction in the cases of forward and reverse bias are established. The heterostructures generate the open-circuit voltage V oc = 0.4 V and the short-circuit current I sc = 1.36 mA/cm2 under illumination with a power density of 80 mW/cm2. |
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