Photoreaction of Titanium-Based Metal-organic Compounds for Ceramic Fine Patterning

The photoreaction of metal-organic compounds prepared by the chemical modification of metal alkoxides was investigated for the patterning of ceramic films. The chemical stability and photoreactivity of these compounds were found to be greatly influenced by the kind of chemical additive applied during the syntheses of the precursor solutions. In this study, the photoreaction of the precursor thin films prepared by the addition of alkanolamines was achieved by tuning the wavelength of the incident UV light. The decomposition of the organic moieties of the percursors was clearly observed in IR spectra during UV irradiation. Furthermore, the spectrum of the titania precursor film in the visible and ultraviolet regions (UV-vis) changed in accordance with the irradiation time. The photolithography of the titanium precursor pattern was successfully achieved by means of these techniques.