| 磁场对电解抛光作用计算机模拟分析 |
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| 引用本文： | 王俊,陈玉全,孙伟岩,时立民,关砚聪.磁场对电解抛光作用计算机模拟分析[J].哈尔滨理工大学学报,2002,7(4):105-107. |
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| 作者姓名： | 王俊 陈玉全 孙伟岩 时立民 关砚聪 |
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| 作者单位： | 哈尔滨理工大学机械动力工程学院,黑龙江,哈尔滨,150080 |
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| 基金项目： | 黑龙江省攻关项目（G96A13-9） |
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| 摘 要： | 通过实验很难观测到磁场对电解抛光的微观作用，因此参照带电粒子在磁场中运动的作用机理，建立起电解抛光时电磁场作用下的带电粒子运动模型，同时采用三维图形标准OpenGL,在VC＋＋的编程环境下，根据建立的运动模型对带电粒子运动轨迹进行模拟分析，证明了磁场可加速带电粒子的扩散和迁移，从而提高了电解抛光加工效率和加工质量。
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| 关 键 词： | 计算机模拟 电解抛光 磁场 带电粒子 运动模型 机械加工 |
| 文章编号： | 1007-2683(2002)04-0105-03 |
| 修稿时间： | 2002年1月4日 |
Computer Simulation Analysis of the Action of Magnetic Field on Electrolysis Polishing |
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| WANG Jun,CHEN Yu-quan,SUN Wei-yan,SHI Li-min,GUAN Yan-cong.Computer Simulation Analysis of the Action of Magnetic Field on Electrolysis Polishing[J].Journal of Harbin University of Science and Technology,2002,7(4):105-107. |
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| Authors: | WANG Jun CHEN Yu-quan SUN Wei-yan SHI Li-min GUAN Yan-cong |
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| Abstract: | The microscopic action of magnetic field on electrolysis polishing is hard to be observed through experiment. According to the function mechanism of magnetic field on charged particles motion, charged particles' motion model on the action of both magnetic field and electric field on electrolysis polishing is established. By using three-dimensional graphic standard-OpenGL under the VC++ compiler environment and the established charged particles' motion model, computer simulation analysis of charged particles motion' loci is accomplished. Ft had been proved that using magnetic field can improve process efficiency and working quality through accelerating diffusion and transference of charged particles. |
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| Keywords: | electrolysis polishing magnetic field simulation analysis |
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