Characterization of silicide phases formed during pack siliconizing coating on the Nb-1Zr-0.1C alloy

The present paper describes the morphology, chemistry and crystallography of the phases observed in the silicide coatings produced by pack cementation technique on Nb based alloys. Cross-sectional microstructures examined by transmission electron microscopy and scanning electron microscopy techniques have shown that the coating has two silicide layers: NbSi₂ and Nb₅Si₃. NbSi₂ formed at the surface of the sample and Nb₅Si₃ formed in between the substrate (Nb alloy) and NbSi₂ coating layer. Electron diffraction analyses revealed that NbSi₂ has hexagonal crystal structure with lattice parameters as a = 0.48 nm and c = 0.66 nm and Nb₅Si₃ has tetragonal crystal structure with lattice parameters as a = 0.65 nm and c = 1.19 nm. Nb₅Si₃ showed fine equiaxed grains, whereas, NbSi₂ exhibited duplex morphology having columnar grain morphology near to the Nb₅Si₃ layer and large equiaxed grains at the surface of the coating sample. The presence of duplex morphology was explained by estimating diffusion of various species and it was shown that columnar morphology of grains could be attributed to outward diffusion of Nb and equiaxed grains to inward diffusion of Si. In the case of Nb₅Si₃, growth takes place due to single element Si diffusion, leading to development of single equiaxed grain morphology of the Nb₅Si₃ phase.