数字灰度投影光刻技术

随着MEMS和MOEMS技术的发展和器件制作对低成本、灵活、高效的需求,数字灰度无掩模光刻技术已成为人们研究的热点。介绍了一种基于数字微镜器件(DMD)的无掩模数字灰度投影光刻技术,结合电寻址数字微镜阵列的工作方式,分析了DMD的灰度调制机理和投影成像特性;阐述了DMD微镜结构与投影系统的倍数、数值孔径的关系;设计了投影光刻系统,并进行了分辨力和三维面形的曝光实验。实验结果表明,数字灰度投影光刻技术灵活、方便,尤其在三维浮雕微结构的制作方面,可实现光刻灰度的数字化调制,表面粗糙度可达0.1μm。

Digital Gray-Tone Projection Lithography

With development of MEMS and MOEMS and meeting the needs of lower cost,flexible and high efficient of the device fabrication,the technique of maskless digital gray-tone projection lithography becomes the research focus.A maskless optical digital gray-tone projection lithography based on digital micromirror device(DMD)was introduced.Combined with the working mode of DMD,the principle of gray-tone modulation and the imaging speciality of DMD were analyzed.The relationships of DMD configuration,the multiple and numerical aperture(NA)of projection lens were discussed.The lithography equipment was designed,and the exposure experiments of resolution and three-dimensional shape were done.The results show that the technique of digital gray-tone projection lithography is flexible and convenient,especially by digital modulating of gray-tone projection lithography,the surface roughness of three-dimensional relief microstructure reaches 0.1 μm.