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Thermally-reacted poly(methacrylamide) as a positive electron beam resist |
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| Authors: | S Matsuda S Tsuchiya M Honma K Hasegawa G Nagamatsu T Asano |
| Abstract: | Thermally-reacted poly(methacrylamide) degrades under high-energy irradiation. It has a sensitivity of 2-3 × 10?7 C/cm2 when exposed to 10 KV electrons. The resist is thermally stable to 330°C and has a high glass transition temperature, 180 200°C. It may be used for the lift-off process and ion-milling. |
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