Plasma parameters and volume kinetics in Cl2/O2 mixtures |
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| Authors: | A. Efremov K.-H. Kwon C.-S. Park S.-I. Choi C. I. Kim S.-H. Chai |
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| Affiliation: | (1) Department of Microelectronic Devices Materials Technology, Ivanovo State University of Chemistry & Technology, 153460, F. Engels st., 7, Ivanovo, Russia;(2) Department of Electronics, Hanseo University, 360 Daegok-Ri, Haemi-Myun, Chung-Nam, 356-820, Korea;(3) School of Electrical and Electronic Eng., Chung-Ang University, 221, Huksuk-Dong, Dongjak-Gu, Seoul, 156-756, Korea;(4) Department of Electronics, Hoseo University, 21 Sechul-Ri, Baebang-Myun, Asan, Chung-Nam, 336-795, Korea;(5) Department of Control & Instrumentation Engineering, Korea University at Jochiwon, Chungnam, 339-700, Korea |
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| Abstract: | We investigated plasma characteristics, plasma mass content and kinetic dependencies of both neutral and charged particle formation and decay in Cl2/O2 gas mixture. For these purposes we used a combination of experimental methods (optical emission spectroscopy, Langmuir probe) and a plasma modeling on the base of self-consistent solution of Boltzmann kinetic equation together with balance kinetic equations for neutral and charged particles in a quasi-stationary approximation. It was found that the change of O2/(Cl2+O2) mixing ratio from 0 to 0.2 leads to an increase of electron average energy and electron energy distribution function (EEDF) deformation. The main mechanisms of Cl and O atom formation are the direct electron impact dissociation of corresponding molecules while the contribution of all possible “secondary” processes is not significant in the case of a relatively low O2 addition. |
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