纳米压印技术

传统光学光刻技术的高成本促使科学家去开发新的非光学方法,以取代集成电路工厂目前所用的工艺.另外,微机电系统(MEMS)的成功启发科学家借用MEMS中的相关技术,将其使用到纳米科技中去,这是得到纳米结构的一种有效途经.纳米压印在过去的几年里受到了高度重视,因为它成功地证明了它有成本低、分辨率高的潜力.纳米压印技术主要包括热压印、紫外压印(含步进-闪光压印)和微接触印刷等.本文详细讨论纳米压印材料的制备及常用的三种工艺的工艺步骤和它们各自的优缺点.并对这三种工艺进行了比较.最后列举了一些典型应用,如微镜、金属氧化物半导体场效应管、光栅等.

Nanoimprint Technology

The high cost in traditional optics lithography drives the scientists to invent new non-optical methods to replace processes currently used in IC factories.Also,the success of MEMS (Micro-electro-mechanical Systems) illumines the scientists that the transition of MEMS technology to nano fabricaton is a wise way to manufacture nano structures.NIL(NanoImprint Lithography) technology has received considerable interest in the last few years because of the successful demonstration of its potential for a low cost, high resolution nano lithographic technique.NIL encompasses a variety of methods including hot embossing lithography,UV imprinting(including step and flash imprint lithography) and microcontact printing.The materials and processes about these techniques will be discussed in detail,as well as their advantages and disadvantages,respectively.A comparison table about these three techniques will be presented.The success and uses of NIL technology are illustrated by some typical applications, such as microlens,MOSFET( metal-oxide-semiconductor field-effect transistors) and gratings.