Influence of Threshold Voltage Performance Analysis on Dual Halo Gate Stacked Triple Material Dual Gate TFET for Ultra Low Power Applications |
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Authors: | Venkatesh M. Balamurugan N. B. |
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Affiliation: | 1.Department of Electronics and Communication Engineering, Thiagarajar College of Engineering, Madurai, TamilNadu, 625015, India ; |
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Abstract: | Silicon - In this article, a two dimensional (2-D) threshold voltage modeling based gate and channel engineering are developed analytically for Dual Halo Gate Stacked Triple Material Dual Gate... |
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