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Influence of Threshold Voltage Performance Analysis on Dual Halo Gate Stacked Triple Material Dual Gate TFET for Ultra Low Power Applications
Authors:Venkatesh  M.  Balamurugan  N. B.
Affiliation:1.Department of Electronics and Communication Engineering, Thiagarajar College of Engineering, Madurai, TamilNadu, 625015, India
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Abstract:Silicon - In this article, a two dimensional (2-D) threshold voltage modeling based gate and channel engineering are developed analytically for Dual Halo Gate Stacked Triple Material Dual Gate...
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