| Abstract: | Impurities containing methylene bridges between 2‐((2′‐ethylhexyl)oxy)‐5‐methoxy‐benzene molecules are inevitably formed during the synthesis of 1,4‐bis(chloromethyl)‐2‐((2′‐ethylhexyl)oxy)‐5‐methoxy‐benzene, the monomer used in the preparation of poly2‐methoxy‐5‐(2′‐ethyl‐hexyloxy)‐1,4‐phenylenevinylene] (MEH‐PPV), but they can be removed by double recrystallization of the monomer prior to polymerization. When impurities containing methylene bridges participate in a Gilch polymerization, the methylene bonds formed in the main chains are prone to break at 200 °C, that is, at least 150 °C below the major degradation temperature of defect‐free MEH‐PPV. Interestingly, the thermal treatment used to break the methylene bonds present reduces the chain aggregation of MEH‐PPV during film formation and induces its blends with poly(2,3‐diphenyl‐5‐octyl‐p‐phenylene‐vinylene) (DPO‐PPV) to form a morphology similar to that of block copolymers. Both significantly enhance the luminescence properties. Copyright © 2006 Society of Chemical Industry |
