| 氧化气氛下铜的氯化过程动力学分析 |
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| 引用本文： | 张光德,阎立懿,解希元,曹洪涛. 氧化气氛下铜的氯化过程动力学分析[J]. 过程工程学报, 2000, 21(3): 288-293 |
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| 作者姓名： | 张光德 阎立懿 解希元 曹洪涛 |
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| 作者单位： | 东北大学材料与冶金学院,辽宁沈阳 110006 |
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| 摘 要： | 根据传输理论,计算了铜氯化过程中混合气体通过浓度边界层向反应界面传质的传质系数;结合实验数据,计算了界面化学反应速率常数,确定了氧化气氛下铜的氯化过程的限制性环节为气体扩散传质和界面化学反应联合控制,并建立了动力学的近似表达式.
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| 关 键 词： | 铜的氯化 动力学 传质 反应速率常数 活化能 |
| 文章编号： | 1001-2052(2000)03-0288-06 |
| 修稿时间： | 1999-06-28 |
Modeling the Kinetics of Chlorinating Copper in Oxidizing Atmosphere |
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| ZHANG Guang-de, YAN Li-yi, XIE Xi-yuan, CAO Hong-tao. Modeling the Kinetics of Chlorinating Copper in Oxidizing Atmosphere[J]. Chinese Journal of Process Engineering, 2000, 21(3): 288-293 |
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| Authors: | ZHANG Guang-de YAN Li-yi XIE Xi-yuan CAO Hong-tao |
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| Abstract: | The mass transfer coefficient of air-Cl2 gas mixture in the concentration boundarylayer is calculated according to the theory of transport phenomena. The surface reaction rateconstant is calculated based on the theory of gas-solid reaction and the experimental results. Itis believed that the process of chlorinating copper in oxidizing atmosphere is controlled jointlyby mass transfer and surface reaction and a kinetic apparent expression is set-up accordingly |
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| Keywords: | chlorination of copper kinetics mass transfer reaction rate constant activation enthalpy |
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