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Reduction of kink effect in thin-film SOI MOSFETs |
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| Authors: | Colinge J.-P. |
| Affiliation: | Hewlett-Packard Labs., Palo Alto, CA; |
| Abstract: | Numerical simulation is used to show that potential and electric field distribution within thin, fully depleted SOI devices is quite different from that observed within thicker, partially depleted devices. Reduction of drain electric field and of source potential barrier brings about a dramatic decrease of kink effect |
| Keywords: | |