Oxygen diffusion mechanisms during high‐temperature oxidation of ZrB2‐SiC

Oxygen diffusion mechanisms during oxidation of ZrB₂‐30 vol% SiC were explored at temperatures of 1500°C and 1650°C using an ¹⁸O tracer technique. Double oxidation experiments in ¹⁶O₂ and ¹⁸O₂ were performed using a modified resistive heating system. A combination of scanning electron microscopy, energy‐dispersive spectroscopy, and time‐of‐flight secondary ion mass spectrometry was used to characterize the borosilicate and ZrO₂ oxidation products. Oxygen exchange with the borosilicate network was observed to occur quickly at the oxygen‐borosilicate surface at both 1500°C and 1650°C, while evidence of oxygen permeation was only observed at 1650°C for short time (<1 min) exposures. At longer times, >5‐9 min, complete oxygen exchange throughout both the borosilicate glass and ZrO₂ was observed at both temperatures preventing identification of the oxygen transport mechanisms, but demonstrating that oxygen transport is rapid in both oxide phases.