Analysis of a shielded microstrip line with finite metallizationthickness by the boundary element method |
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| Authors: | The Nan Chang Chung-Hsing Tan |
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| Affiliation: | Dept. of Electr. Eng., Tatung Inst. of Technol., Taipei; |
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| Abstract: | A boundary element method is presented for the quasi-static analysis of a shielded microstrip line with finite metallization thickness. The analysis is based on the solution of a system of boundary integral equations which are derived from Green's second identity. Numerical results for the charge distribution along the strip and the effects of metallization thickness on line characteristics are presented. The results show good agreement with data available in the literature |
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