| 低介电常数纳米多孔氧化硅薄膜的研究进展 |
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| 引用本文： | 杨大祥,冯坚,周新贵,张长瑞,王娟.低介电常数纳米多孔氧化硅薄膜的研究进展[J].电子元件与材料,2004,23(9):41-45. |
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| 作者姓名： | 杨大祥 冯坚 周新贵 张长瑞 王娟 |
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| 作者单位： | 国防科技大学航天与材料学院,湖南,长沙,410073;国防科技大学航天与材料学院,湖南,长沙,410073;国防科技大学航天与材料学院,湖南,长沙,410073;国防科技大学航天与材料学院,湖南,长沙,410073;国防科技大学航天与材料学院,湖南,长沙,410073 |
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| 摘 要： | 纳米二氧化硅(NPS)薄膜是新型微波大功率器件和超大规模集成电路(ULSI)互连系统的最佳候选绝缘介质之一,有着广泛的应用前景。介绍了NPS薄膜的制备工艺,综述了NPS薄膜的国内外研究进展及其检测方法,并探讨了NPS薄膜材料的弱点以及今后应进一步研究的若干问题。
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| 关 键 词： | 电子技术 纳米多孔氧化硅薄膜 综述 检测方法 |
| 文章编号： | 1001-2028(2004)09-0041-05 |
Progress in Research on Low Dielectric Constant-nanoporous Silica Films |
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| YANG Da-xiang,FENG Jian,ZHOU Xin-gui,ZHANG Chang-rui,WANG Juan.Progress in Research on Low Dielectric Constant-nanoporous Silica Films[J].Electronic Components & Materials,2004,23(9):41-45. |
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| Authors: | YANG Da-xiang FENG Jian ZHOU Xin-gui ZHANG Chang-rui WANG Juan |
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| Abstract: | Nanoporous silica films with a great potential for applications in the near future are one of the best insulated midium which could be applied in interconnect system of super large-scale integration (ULSI) and high-capability, high-power microwave apparatus. The fabrication and the character of NPS films were introduced, the detection methods, the progress at home and abroad were reviewed and the disadvantage of NPS films and the problems that should be further studied were discussed. |
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| Keywords: | electronic technology nanoporous silica films review detection method |
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