Investigations of Electrical Properties in Silica/Indium Tin Oxide Two-Layer Film for Effective Electromagnetic Shielding |
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Authors: | Sang Woo Kim Jong-Ho Lee Joosun Kim Hae-Weon Lee |
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Affiliation: | Nano-Materials Research Center, KIST, 39-1 Hawolgok-Dong, Sungbuk-Gu, Seoul, 136-791, Korea |
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Abstract: | The effect of zinc ions added to silica film on the electrical and structural properties of a silica/indium tin oxide two-layer film which had been prepared by solution coating for electromagnetic shielding of displays was studied. The volume resistivity of the undoped silica/indium tin oxide film was more than 3 times as high as that of the zinc-doped silica/indium tin oxide film. The addition of divalent cations, zinc ions, to the overcoated layer led volume resistivity of the two-layer film to decrease significantly and also caused a long-term increase in stability. The decrease in volume resistivity was due to the addition of zinc ions that changed the interface ionization and helped to enhance the electrical conductivity in the two-layer film. |
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Keywords: | electrical properties silica indium/indium compounds |
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