| 硅基硫化锌薄膜的溅射法生长技术 |
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| 引用本文： | 陈松岩 陈谋智 等. 硅基硫化锌薄膜的溅射法生长技术[J]. 光电子．激光, 2001, 12(9): 896-898 |
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| 作者姓名： | 陈松岩 陈谋智 等 |
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| 作者单位： | 厦门大学物理学系 |
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| 基金项目： | 福建省自然科学基金资助项目 ( 99-H-4 7) |
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| 摘 要： | 利用射频磁控溅法在Si衬底上制备ZnS薄膜，用X射线衍射技术对薄膜的结构相变进行研究，揭示了Si衬底上ZnS薄膜的微观结构和相变特征与溅射功率的关系，为寻找高新发光材料提供依据。
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| 关 键 词： | 溅射法 硅基 硫化锌 薄膜 |
| 文章编号： | 1005-0086(2001)09-0896-03 |
| 修稿时间： | 2001-01-22 |
Crystal Growth of ZnS Thin Film on Si Substrate by RF Magnetron Sputtering |
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| CHEN Song yan,CHEN Mou zhi,LIU Zhao hong,LIU Rui tang. Crystal Growth of ZnS Thin Film on Si Substrate by RF Magnetron Sputtering[J]. Journal of Optoelectronics·laser, 2001, 12(9): 896-898 |
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| Authors: | CHEN Song yan CHEN Mou zhi LIU Zhao hong LIU Rui tang |
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| Abstract: | The ZnS thin film was grown on Si substrate by radio frequency magnetron sputtering (RFSP).The structure and phase transition of the film were evaluated with X ray diffraction (XRD) technique.The results show some characterization of micro structure and phase transition of ZnS thin film prepared by RFSP.All of these can be used to gain an insight into the mechanism of TFEL and to find a new EL material with high brightness. |
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| Keywords: | radio frequence magnetron sputtering (RFSP) micro structure ZnS thin film phase transition characterization |
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