Département de Physique des Matériaux (URA CNRS 172), Université Claude Bernard — Lyon I, 69622, Villeurbanne Cédex, France
Abstract:
-Al2O3 single crystals were bombarded with MeV xenon ions from 1015 to 1017 ions cm?2 and GeV uranium ions from 1011 to 1013 ions cm?2 to study the surface swelling of sapphire at 77 and 300 K due to atomic collision processes (Xe) and electronic energy loss processes in the 20–45 keV/nm regime (U). The induced damage was studied by channeling Rutherford backscattering. Surface swelling was measured with a profilometer. The step height induced by nuclear cascades of MeV xenon increases with the ion fluence and saturates. With GeV uranium, an electronic stopping power threshold for surface swelling was observed and the step height increased with the damage for dE/dx higher than this threshold.