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Influence of Working Pressure on Ion Sensitive Probe Measurement in Microwave ECR Plasmas |
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| Authors: | MA Zhibin;WU Jun;TAN Bisong;SHEN Wulin;PAN Xin;WANG Jianhua |
| Affiliation: | MA Zhibin;WU Jun;TAN Bisong;SHEN Wulin;PAN Xin;WANG Jianhua;Province Key Laboratory of Plasma Chemistry and Advanced Materials,School of Materials Science and Engineering,Wuhan Institute of Technology; |
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| 本文献已被 CNKI 等数据库收录！ | |