| 用Al或Mo/Al/Mo低阻材料改善4-Mask工艺中Al腐蚀的方法 |
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| 引用本文： | 劉聖烈,崔螢石,金奉柱,柳在一,李禹奉,李貞烈.用Al或Mo/Al/Mo低阻材料改善4-Mask工艺中Al腐蚀的方法[J].液晶与显示,2006,21(5):501-505. |
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| 作者姓名： | 劉聖烈 崔螢石 金奉柱 柳在一 李禹奉 李貞烈 |
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| 作者单位： | 京东方科技集团股份有限公司,中央研究院,利川,467-701,韩国 |
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| 基金项目： | Supported by Key Itemof Beijing Scientific and Technical Project(No .D0304002) |
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| 摘 要： | 为了减少制造工艺的过程,改进的4-Mask工艺中采用Al基的数据线已得到进一步的完善。但这个工艺仍存在很多问题,主要是为减少工艺过程,而引入干法刻蚀对Al有腐蚀作用。本文应用CF4/O2等离子体处理,很好地阻止了对Al的腐蚀,得到很好的效果,对改进后4-Mask工艺的进一步应用具有非常重要的意义。
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| 关 键 词： | 液晶显示器 腐蚀 Al Mo/Al/ Mo 等离子体处理 |
| 文章编号： | 1007-2780(2006)05-0501-05 |
| 修稿时间： | 2006年7月19日 |
Preventing Method of Al Corrosion for Applying Improved 4-Mask with Low Resistance Material Al or Mo/Al/Mo |
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| Seong-yeol YOO,Hyung-suk CHOI,Bong-joo KIM,Jai-il RYU,Woo-bong LEE,Jung-yeol LEE.Preventing Method of Al Corrosion for Applying Improved 4-Mask with Low Resistance Material Al or Mo/Al/Mo[J].Chinese Journal of Liquid Crystals and Displays,2006,21(5):501-505. |
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| Authors: | Seong-yeol YOO Hyung-suk CHOI Bong-joo KIM Jai-il RYU Woo-bong LEE Jung-yeol LEE |
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| Abstract: | Improved 4-Mask process applied with Al based data line was developed in order to reduce manufacturing process. This process has several issues. Most of them are Al corrosion because of applying to dry etch for process step reduction. However, it brings a matter to a successfully settlement and meets with good results about Al corrosion prevention using CF_4/O_2 plasma treatment. Moreover, it brings successfully results to be applied to improved 4-Mask process. |
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| Keywords: | LCD corrosion Al Mo/Al/Mo plasma treatment |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
