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高矫顽力CoFe2O4薄膜的研究进展及矫顽力机理分析
引用本文:金沈贤,钟智勇,张怀武.高矫顽力CoFe2O4薄膜的研究进展及矫顽力机理分析[J].磁性材料及器件,2007,38(5):8-11.
作者姓名:金沈贤  钟智勇  张怀武
作者单位:电子科技大学,微电子与固体电子学院,四川成都,610054;电子科技大学,微电子与固体电子学院,四川成都,610054;电子科技大学,微电子与固体电子学院,四川成都,610054
摘    要:矫顽力是钴铁氧体薄膜作为高密度磁记录以及磁光记录介质的重要指标.本文综述了激光脉冲沉积法和磁控溅射法制备的高矫顽力(大于400kA/m)钴铁氧体薄膜材料的国内外研究进展,并对其高矫顽力的产生机理进行了分析.

关 键 词:钴铁氧体薄膜  磁记录  磁光记录  矫顽力
文章编号:1001-3830(2007)05-0008-04
修稿时间:2007-03-232007-06-25

Coercivity Mechanism and Research Progress of Highly Coercive CoFe2O4 Thin Films
JIN Shen-xian,ZHONG Zhi-yong,ZHANG Huai-wu.Coercivity Mechanism and Research Progress of Highly Coercive CoFe2O4 Thin Films[J].Journal of Magnetic Materials and Devices,2007,38(5):8-11.
Authors:JIN Shen-xian  ZHONG Zhi-yong  ZHANG Huai-wu
Affiliation:Institute of Micro-Electronics and Solid-State Electronics, University of Electronic Science and Technology of China, Chengdu 610054, China
Abstract:The coercivity of cobalt ferrite thin film is one of the most important properties in applications for high density magnetic recording and magneto-optical recording. The research progress of high coercivity (higher than 400kA/m) cobalt ferrite thin films that mainly prepared by pulse laser deposition (PLD) and magnetron sputtering were summarized and the mechanism of high coercivity of these films was analysed in this paper.
Keywords:cobalt ferrite thin films  magnetic recording  magneto-optical recording  coercivity
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