| 磁头/磁盘表面保护膜及抗吸附分子膜研究 |
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| 引用本文： | 张晨辉,马天宝,钟敏. 磁头/磁盘表面保护膜及抗吸附分子膜研究[J]. 数字制造科学, 2007, 5(2) |
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| 作者姓名： | 张晨辉 马天宝 钟敏 |
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| 摘 要： | 在中国国家自然科学基金重大项目《先进电子制造中的重要科学技术问题研究》资助下，针对2nm厚度的DLC薄膜的制备和磁头、磁盘间的吸附等问题，探索“磁头、磁盘表面润滑规律和超薄保护膜的生长机理及技术”，目标是寻找磁头、磁盘表面超薄DLC薄膜新的制备方法和制备工艺，发现超薄DLC保护膜的生长机理和生长极限，开发磁头表面抗吸附分子膜的制备技术。报告研究所取得的体系化理论成果。 为了制备厚度为2nm的超薄DLC薄膜，使用FCVA技术代替磁控溅射和CVD技术。通过优化制备参数，制备出厚度为2nm，表面粗糙度为0.128nm，并且连续均匀的DLC薄膜。探索基体形貌对薄膜生长模式的影响规律。发现在脉冲偏压幅值-100V、占空比20%条件下制备的薄膜性能最优
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| 关 键 词： | 超薄膜 DLC薄膜 FCVA 分子动力学模拟 反应键序经验势函数 最小膜厚极限 自组装膜 FATS |
Research on the Protection Film and Anti Adsorption Molecular Film on the Surfaces of Magnetic Head and Disk |
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| Ding Han,Liu Qiang,Yin Zhouping,et al. Research on the Protection Film and Anti Adsorption Molecular Film on the Surfaces of Magnetic Head and Disk[J]. Digital Manufacture Science, 2007, 5(2) |
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| Authors: | Ding Han Liu Qiang Yin Zhouping et al |
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| Abstract: | this research is funded by the Study on the Key Scientific and Technological Issues in the Process of Advanced Electronic Manufacturing of NSFC. The research includes three parts: the preparation and the characteristics of ultra thin DLC films; the growth mechanism of the ultra thin DLC films, and the preparation of anti adsorption molecular films on the magnetic head. The present work introduces the progress and the systematic results of the project. In order to prepare the ultra thin DLC films with thickness of 2 nm, the filtered cathodic vacuum arc (FCVA) system was |
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| Keywords: | ultra thin film DLC thin film FCVA molecular dynamic simulation reactive empirical bond order potential function minimum film thickness self-assembled monolayers FATS |
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