| HFCVD方法沉积金刚石薄膜的生长研究 |
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| 引用本文： | 杨国伟,毛友德. HFCVD方法沉积金刚石薄膜的生长研究[J]. 量子电子学报, 1994, 0(4) |
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| 作者姓名： | 杨国伟 毛友德 |
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| 作者单位： | 航空航天部第０１４中心，合肥工业大学应用物理系 |
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| 摘 要： | 本文讨论了金刚石薄膜应用于光学领域所遇到的问题，研究了热丝ＣＶＤ（ＨＦＣＶＤ）方法生长应用于光学膜的金刚石薄膜过程中，衬底表面的预处理和沉积条件如碳源浓度、衬底温度等对制备腹晶粒尺度和晶粒间界以及膜表面形貌的影响．
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| 关 键 词： | 热丝CVD，金刚石薄膜，光学膜 |
Study of Diamond Thin Films Growth by HFCVD |
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| Yang Guowei. Study of Diamond Thin Films Growth by HFCVD[J]. Chinese Journal of Quantum Electronics, 1994, 0(4) |
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| Authors: | Yang Guowei |
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| Abstract: | Some problems,which exist in the useful optical application of diamond thin films,have been discussedin this paper.In diamond thin films growth by HFCVD,the effects of pre-handle of substrates and carbonconcentrate of reation gas,substrates temperature on the grains size,grain boundry and surface morphologof the resulting films have been studied. |
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| Keywords: | HFCVD diamond thin films optical films |
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