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Study of the effect of ion-stimulated deposition assisted by a pulsed laser on the properties of zinc oxide nanocrystalline films |
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| Authors: | O. A. Ageev A. P. Dostanko V. N. Dzhuplin E. G. Zamburg D. E. Vakulov Z. E. Vakulov A. M. Alekseev D. A. Golosov S. M. Zavadski |
| Affiliation: | 1. Institute of Nanotechnology, Electronics and Electronic Equipment Engineering, Southern Federal University, Shevcenko str. 2, Taganrog, 347905, Russia 2. Belarusian State University of Informatics and Radioelectronics, P. Brovka str. 6, Minsk, 220013, Belarus 3. School of Physics and Astronomy, University of Glasgow, University Str., Glasgow, G128QQ, UK |
| Abstract: | Nanocrystalline thin films of ZnO have been fabricated using the pulsed laser deposition method. The influence of the ion/atom ratio on the structural, morphological, and electrical parameters of these films is considered. It is established that, in the case of ion action on thin films, their crystalline structure and electrophysical properties are significantly changed. It is demonstrated that modes of ion-assisted deposition can help to control the average grain size in the range from 75.4 ± 2.0 nm to 79.1 ± 2.0 nm, the roughness in the range from 2.14 ± 1.11 nm to 7.30 ± 1.25 nm, and the resistivity and mobility in the range from (22.6 ± 2) × 10?4 Ohm cm to (33.6 ± 2) × 10?4 Ohm cm and from 28.21 ± 4.60 cm2/V s to 71.92 ± 2.50 cm2/V s, respectively. |
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