A power supply for magnetron sputtering systems

A design and electric circuits of the power supply for magnetron sputtering systems with a power of up to 5 kW are described. The power supply is intended for operation in direct-current (DC) or pulse modes with a pulse repetition rate of up to 100 kHz. The arc suppression system limits the energy delivered to the arc discharge at about 110 mJ in the DC mode and 9 mJ in the pulse mode, respectively. The possibilities of optimizing coatings by selecting working parameters of the power supply were demonstrated by the example of thin-film coatings of two types (Ag and Ga-doped ZnO thin films).