| Abstract: | Nanoimprint Lithography has been demonstrated to be one of the most promising next generation techniques for large-area structure replication in the nanometer scale.This fast and low cost method becomes an increasingly important instrument for fabrication of biochemistry,μ-fluidic,μ-TAS and telecommunication devices,as well as for a wide variety of fields in the nm range,like biomedical,nano-fluidics,nano-optical applications,data storage,etc.Due to the restrictions on wavelength and the enormous development works,linked to high process and equipment costs on standard lithography systems,nanoimprint lithography might become a real competitive method in mainstream IC industry.There are no physical limitations encountered with imprinting techniques for much smaller replicated structures,down to the sub-10nm range [1].Among several Nanoimprint lithography techniques results of two promising methods,hot embossing lithography(HEL)and UV-nanoimprinting(UV-NIL)will be presented.Both techniques allow rapid prototyping as well as high volume production of fully patterned substrates for a wide range of materials.This paper will present results on HE and UVNIL,among them full wafer imprints up to 200mm with high-resolution patterns down to nm range. |
