| Abstract: | An overview on the potential of medium to atmospheric pressure processes will be given and discussed in context to production applications. The introduction of the medium to atmospheric pressure plasma source is a huge progress and a valuable, attractive tool. The plasma source bases on the concept of cy lindrical r esonator with annu lar s lots (CYRANNUS®). High process speed and reliability are the most important facts for technical applications. Parameters as gas/flow dynamic can be controlled and lead to further improvements of equipment and process design. The CYRANNUS® plasma is used in down‐stream configuration for several applications such as glass films on polymer substrate to reduce oxygen permeation, protective coatings against corrosion or wear and hydrophilic or hydrophobic surface properties. Also etching or cleaning can be done easily because of arbitrary process gas in the plasma source. The advantage of medium pressure is higher supply of reactive species and improved transportation of reaction products. Various processes with plasma surface interaction are discussed from physical and technical viewpoint as plasma enhanced CVD, plasma polymerisation on metal or polymer substrates. Using the advantages of medium pressure plasma processes consequently leads to new design of equipment and material flow. In‐line/on‐line treatment of 3‐D material becomes most efficient and enables competitive plasma processes for mass productions. For diamond deposition a larger size of the plasma at high pressure processes are essential for a device with best economics. |
