| 工艺参数对磁控溅射TiN膜成分影响的研究 |
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| 引用本文： | 刘雄飞,涂国辉. 工艺参数对磁控溅射TiN膜成分影响的研究[J]. 真空科学与技术学报, 1999, 0(3) |
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| 作者姓名： | 刘雄飞 涂国辉 |
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| 作者单位： | 中南工业大学应用物理与热能工程系!长沙410083 |
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| 摘 要： | 在不同的工艺参数条件下 ,采用磁控溅射技术制备了大量的TiN膜样品。通过对实验结果的仔细分析 ,得出了膜层颜色与氩气分压无关 ,而与溅射功率和氮气分压的比值有关的结论 ,并得到了微观结构分析的证实。对磁控溅射法制备TiN膜技术具有一定的参考价值
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| 关 键 词： | 磁控溅射 TiN 镀膜 |
Growth Parameters and Surface Stoichiometery of TiN Films Grown by Magnetron Sputtering |
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| Liu Xiongfei,Tu Guohui. Growth Parameters and Surface Stoichiometery of TiN Films Grown by Magnetron Sputtering[J]. JOurnal of Vacuum Science and Technology, 1999, 0(3) |
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| Authors: | Liu Xiongfei Tu Guohui |
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| Affiliation: | Liu Xiongfei,Tu GuohuiDepartment of Applied Physics and Heat Engineering,Central South University of Technology,Changsha,410083 |
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| Abstract: | TiN films grown by magnetron sputtering under different conditions were systematically studied with X ray Photoelectron spectroscopy.The results show that the color of the TiN films depends significantly on the ratio of nitrogen partial pressure and sputtering power but it is independent of argon partial pressure. |
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| Keywords: | Magnetron sputtering TiN Plated |
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