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Nanoengineering: Atomic Layer Engineering of Perovskite Oxides for Chemically Sharp Heterointerfaces (Adv. Mater. 48/2012)
Authors:Woo Seok Choi  Christopher M. Rouleau  Sung Seok A. Seo  Zhenlin Luo  Hua Zhou  Timothy T. Fister  Jeffrey A. Eastman  Paul H. Fuoss  Dillon D. Fong  Jonathan Z. Tischler  Gyula Eres  Matthew F. Chisholm  Ho Nyung Lee
Affiliation:1. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA;2. Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA;3. Department of Physics and Astronomy, University of Kentucky, Lexington, KY 40506, USA;4. Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA;5. National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China;6. X‐ray Science Division, Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA
Abstract:
Keywords:perovskite oxide interface  pulsed laser deposition  LaAlO3/SrTiO3  atomic layer engineering  epitaxial strain
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