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3D Patterning: 3D Free‐Form Patterning of Silicon by Ion Implantation,Silicon Deposition,and Selective Silicon Etching (Adv. Funct. Mater. 19/2012) |
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| Authors: | Andreas C. Fischer Lyubov M. Belova Yuri G. M. Rikers B. Gunnar Malm Henry H. Radamson Mohammadreza Kolahdouz Kristinn B. Gylfason Göran Stemme Frank Niklaus |
| Affiliation: | 1. KTH Royal Institute of Technology, Microsystem Technology Laboratory, 10044 Stockholm, Sweden;2. KTH Royal Institute of Technology, Engineering Materials Physics Laboratory, 10044 Stockholm, Sweden;3. FEI Electron Optics, Achtseweg Noord 5, 5600 KA Eindhoven, The Netherlands;4. KTH Royal Institute of Technology, Integrated Devices and Circuits, 16440 Kista, Sweden |
| Abstract: | |
| Keywords: | microelectromechanical systems nanostructures additive layer‐by‐layer fabrication 3D silicon patterning focused ion beam (FIB) implantation |