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Investigation of aluminum gate CMP in a novel alkaline solution |
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| Authors: | Feng Cuiyue Liu Yuling Sun Ming Zhang Wenqian Zhang Jin Wang Shuai |
| Affiliation: | Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China |
| Abstract: | |
| Keywords: | alkaline solution aluminum CMP electrochemical surface micromorphology |
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